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Protection Gate Valve

** Application


- Etch, CVD (MO, PE, HDP, LP)Implant, Sputtering
- Nanotechnology process with high particulate levels
- Thin film photovoltaic panels


** Features


- Protects process environment from back-streaming powder in the event of dry pump failure
- Reduces expensive down time in powder producing process
Fast pneumatic actuation-closes in <0.5 seconds(Normal 0.7seconds)
- Long cycle life under adverse process conditions


** Options


- Available with either ISO 100-K or ISO 160-K flanges
- 1, 2, 3 or 4 channel options
Products Info

Valve_map08.gif

SIZE : ISO-63, 80, 100,125, 160, 200, ETC Dimensions Approximate


**Specifications

Pressure range 1 X10-7mbar.l/s
Leak rate : body, seat <6 X 10-8mbar.l/s
Differential pressure on the gate ≤ 1.2 bar in either direction
Material Valvebody, bonnet seal, blade SS304
Welded bellows SS316L
Valve actuator
AL6061
Seal Materials VITON (option KALREZ,ETC)
Temperature Valve body 120°C (option 180°C)
Valve actuator 80°C
Operation Double acting
Cycle until first service ≥ 100,000
Position sensor (open/close) - Reed switch SMC(D-A93)
     
 
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